Selective Titanium Etchant (Fluoride salt)

・ Suitable for etching of various titanium sputtering layers on substrates.
・ The potion does not contain hydrofluoric acid, but is replaced by a more stable fluorene, which has less pollution to the human environment.
・ Significantly selective etching, extremely low attack on metals on copper, nickel, silver, tin and other substrates.
・ Large carrying capacity for dissolved metals, can be controlled with acid equivalent, and TIF-50R can be added
Etching Chemical 1267401