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TIF-50

Selective Titanium Etchant (Fluoride salt)

It is suitable for the etching of sputtered titanium layer on various substrates, and the etching speed is fast. The syrup does not contain hydrofluoric acid, but is replaced with a more stable fluorine salt, which causes little environmental pollution to personnel. It has significant selective etching, and has very low attack on metals on copper, nickel, tin, silver, gold and other substrates. For the large carrying capacity of dissolved metals, it can be used with acid equivalent control and TIF-50R can be added. 1267401