蝕刻液、剝膜液、前後處理液、晶圓清洗液、雷射保護劑

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NiCr-50S3
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NiCr-50S

Nickel chromium silicon etching solution

NiCr-50S uses a mixed acid system with a relatively stable etching rate, which can effectively control the etching amount and improve the etching accuracy. This product especially contains a protective agent, which can effectively form a water-based coating film on the conductive layer (copper, silver... etc.) and reduce the corrosion of copper and silver during the etching process. The protective agent is extremely hydrophilic, and it can be easily removed by rinsing with clean water after etching, without affecting the subsequent manufacturing process.
1. Does not damage other metals such as copper and silver.
2. The catalyst is not easy to crack, can maintain a stable etching rate, and has good stability to temperature.
3. Low side corrosion of copper layer lines.

1399010