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TIF-50N3
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TIF-50N

High-speed titanium etching solution

TIF-50N titanium etching solution is suitable for the titanium etching process with a thickness of more than micrometers, and the etching speed is fast and uniform. The syrup is stable and does not contain hydrofluoric acid, which causes little environmental pollution to personnel. Large load capacity for dissolved metals. Titanium etching solution 1399012